High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching
Research output: Contribution to journal › Journal article › Research › peer-review
| Original language | English |
|---|---|
| Journal | ACS Applied Nano Materials |
| Volume | 1 |
| Issue number | 6 |
| Pages (from-to) | 2476-2482 |
| ISSN | 2574-0970 |
| DOIs | |
| Publication status | Published - 1 Jun 2018 |
- atomic layer etching (ALE), nanoimprint lithography (NIL), nanopillar, nanofeatures, pattern transfer
Research areas
ID: 216156091