Polarizer stencil mask: The present disclosure relates to a stencil mask and a method for defining patterns on substrates, suitable for fabrication of nanoscale devices, semiconductor devices, biological applications, flexible electronics or photonics.

Publikation: Patent

Standard

Polarizer stencil mask : The present disclosure relates to a stencil mask and a method for defining patterns on substrates, suitable for fabrication of nanoscale devices, semiconductor devices, biological applications, flexible electronics or photonics. / Eichinger, Michaela (Opfinder); Kanne, Thomas (Opfinder); Særkjær, Tobias Skov (Opfinder); Kjaergaard, Morten (Opfinder); Krogstrup, Peter (Opfinder).

Patentnummer: P6493PC00.

Publikation: Patent

Harvard

Eichinger, M, Kanne, T, Særkjær, TS, Kjaergaard, M & Krogstrup, P, Polarizer stencil mask: The present disclosure relates to a stencil mask and a method for defining patterns on substrates, suitable for fabrication of nanoscale devices, semiconductor devices, biological applications, flexible electronics or photonics., Patentnummer P6493PC00.

APA

Eichinger, M., Kanne, T., Særkjær, T. S., Kjaergaard, M., & Krogstrup, P. (2023). Polarizer stencil mask: The present disclosure relates to a stencil mask and a method for defining patterns on substrates, suitable for fabrication of nanoscale devices, semiconductor devices, biological applications, flexible electronics or photonics.. Manuskript afsendt til publicering. (Patentnummer P6493PC00).

Vancouver

Eichinger M, Kanne T, Særkjær TS, Kjaergaard M, Krogstrup P, Opfindere. Polarizer stencil mask: The present disclosure relates to a stencil mask and a method for defining patterns on substrates, suitable for fabrication of nanoscale devices, semiconductor devices, biological applications, flexible electronics or photonics. P6493PC00. 2023 aug.

Author

Eichinger, Michaela (Opfinder) ; Kanne, Thomas (Opfinder) ; Særkjær, Tobias Skov (Opfinder) ; Kjaergaard, Morten (Opfinder) ; Krogstrup, Peter (Opfinder). / Polarizer stencil mask : The present disclosure relates to a stencil mask and a method for defining patterns on substrates, suitable for fabrication of nanoscale devices, semiconductor devices, biological applications, flexible electronics or photonics. Patentnummer: P6493PC00.

Bibtex

@misc{7764759ae5b24e20837b7e6ed8883722,
title = "Polarizer stencil mask: The present disclosure relates to a stencil mask and a method for defining patterns on substrates, suitable for fabrication of nanoscale devices, semiconductor devices, biological applications, flexible electronics or photonics.",
author = "Michaela Eichinger and Thomas Kanne and S{\ae}rkj{\ae}r, {Tobias Skov} and Morten Kjaergaard and Peter Krogstrup",
year = "2023",
month = aug,
language = "English",
type = "Patent",
note = "P6493PC00",

}

RIS

TY - PAT

T1 - Polarizer stencil mask

T2 - The present disclosure relates to a stencil mask and a method for defining patterns on substrates, suitable for fabrication of nanoscale devices, semiconductor devices, biological applications, flexible electronics or photonics.

AU - Eichinger, Michaela

AU - Kanne, Thomas

AU - Særkjær, Tobias Skov

AU - Kjaergaard, Morten

AU - Krogstrup, Peter

PY - 2023/8

Y1 - 2023/8

M3 - Patent

M1 - P6493PC00

ER -

ID: 371617528