Polarimetric analysis of stress anisotropy in nanomechanical silicon nitride resonators
Research output: Contribution to journal › Journal article › Research › peer-review
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Polarimetric analysis of stress anisotropy in nanomechanical silicon nitride resonators. / Capelle, Thibault; Tsaturyan, Y.; Barg, A.; Schliesser, A.
In: Applied Physics Letters, Vol. 110, No. 18, 181106, 01.05.2017.Research output: Contribution to journal › Journal article › Research › peer-review
Harvard
Capelle, T, Tsaturyan, Y, Barg, A & Schliesser, A 2017, 'Polarimetric analysis of stress anisotropy in nanomechanical silicon nitride resonators', Applied Physics Letters, vol. 110, no. 18, 181106. https://doi.org/10.1063/1.4982876
APA
Capelle, T., Tsaturyan, Y., Barg, A., & Schliesser, A. (2017). Polarimetric analysis of stress anisotropy in nanomechanical silicon nitride resonators. Applied Physics Letters, 110(18), [181106]. https://doi.org/10.1063/1.4982876
Vancouver
Capelle T, Tsaturyan Y, Barg A, Schliesser A. Polarimetric analysis of stress anisotropy in nanomechanical silicon nitride resonators. Applied Physics Letters. 2017 May 1;110(18). 181106. https://doi.org/10.1063/1.4982876
Author
Bibtex
@article{0244488a9d7f401fbf771ca598a4e1d3,
title = "Polarimetric analysis of stress anisotropy in nanomechanical silicon nitride resonators",
author = "Thibault Capelle and Y. Tsaturyan and A. Barg and A. Schliesser",
year = "2017",
month = may,
day = "1",
doi = "10.1063/1.4982876",
language = "English",
volume = "110",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics",
number = "18",
}
RIS
TY - JOUR
T1 - Polarimetric analysis of stress anisotropy in nanomechanical silicon nitride resonators
AU - Capelle, Thibault
AU - Tsaturyan, Y.
AU - Barg, A.
AU - Schliesser, A.
PY - 2017/5/1
Y1 - 2017/5/1
U2 - 10.1063/1.4982876
DO - 10.1063/1.4982876
M3 - Journal article
VL - 110
JO - Applied Physics Letters
JF - Applied Physics Letters
SN - 0003-6951
IS - 18
M1 - 181106
ER -
ID: 182225071