Polarizer stencil mask: The present disclosure relates to a stencil mask and a method for defining patterns on substrates, suitable for fabrication of nanoscale devices, semiconductor devices, biological applications, flexible electronics or photonics.
Research output: Patent
Original language | English |
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Patent number | P6493PC00 |
Country/Territory | Denmark |
Publication status | Submitted - Aug 2023 |
ID: 371617528