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High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching. / Khan, Sabbir A.; Suyatin, Dmitry B.; Sundqvist, Jonas; Graczyk, Mariusz; Junige, Marcel; Kauppinen, Christoffer; Kvennefors, Anders; Huffman, Maria; Maximov, Ivan.
I:
ACS Applied Nano Materials, Bind 1, Nr. 6, 01.06.2018, s. 2476-2482.
Publikation: Bidrag til tidsskrift › Tidsskriftartikel › Forskning › fagfællebedømt
Harvard
Khan, SA, Suyatin, DB, Sundqvist, J, Graczyk, M, Junige, M, Kauppinen, C, Kvennefors, A, Huffman, M & Maximov, I 2018, '
High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching',
ACS Applied Nano Materials, bind 1, nr. 6, s. 2476-2482.
https://doi.org/10.1021/acsanm.8b00509APA
Khan, S. A., Suyatin, D. B., Sundqvist, J., Graczyk, M., Junige, M., Kauppinen, C., Kvennefors, A., Huffman, M., & Maximov, I. (2018).
High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching.
ACS Applied Nano Materials,
1(6), 2476-2482.
https://doi.org/10.1021/acsanm.8b00509Vancouver
Khan SA, Suyatin DB, Sundqvist J, Graczyk M, Junige M, Kauppinen C o.a.
High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching.
ACS Applied Nano Materials. 2018 jun. 1;1(6):2476-2482.
https://doi.org/10.1021/acsanm.8b00509Author
Khan, Sabbir A. ; Suyatin, Dmitry B. ; Sundqvist, Jonas ; Graczyk, Mariusz ; Junige, Marcel ; Kauppinen, Christoffer ; Kvennefors, Anders ; Huffman, Maria ; Maximov, Ivan. / High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching. I: ACS Applied Nano Materials. 2018 ; Bind 1, Nr. 6. s. 2476-2482.
Bibtex
@article{9ef8d72f2f0a402a9ae87d10c10a3492,
title = "High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching",
keywords = "atomic layer etching (ALE), nanoimprint lithography (NIL), nanopillar, nanofeatures, pattern transfer",
author = "Khan, {Sabbir A.} and Suyatin, {Dmitry B.} and Jonas Sundqvist and Mariusz Graczyk and Marcel Junige and Christoffer Kauppinen and Anders Kvennefors and Maria Huffman and Ivan Maximov",
year = "2018",
month = jun,
day = "1",
doi = "10.1021/acsanm.8b00509",
language = "English",
volume = "1",
pages = "2476--2482",
journal = "ACS Applied Nano Materials",
issn = "2574-0970",
publisher = "American Chemical Society",
number = "6",
}
RIS
TY - JOUR
T1 - High-Definition Nanoimprint Stamp Fabrication by Atomic Layer Etching
AU - Khan, Sabbir A.
AU - Suyatin, Dmitry B.
AU - Sundqvist, Jonas
AU - Graczyk, Mariusz
AU - Junige, Marcel
AU - Kauppinen, Christoffer
AU - Kvennefors, Anders
AU - Huffman, Maria
AU - Maximov, Ivan
PY - 2018/6/1
Y1 - 2018/6/1
KW - atomic layer etching (ALE)
KW - nanoimprint lithography (NIL)
KW - nanopillar
KW - nanofeatures
KW - pattern transfer
U2 - 10.1021/acsanm.8b00509
DO - 10.1021/acsanm.8b00509
M3 - Journal article
VL - 1
SP - 2476
EP - 2482
JO - ACS Applied Nano Materials
JF - ACS Applied Nano Materials
SN - 2574-0970
IS - 6
ER -
